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1 article(s) from Kateb, Movaffaq

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Hamidreza Hajihoseini,
Movaffaq Kateb,
Snorri Þorgeir Ingvarsson and
Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

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Figure 1: (a) Film density, (b) deposition rate, and (c) surface roughness of nickel films deposited by HiPIM...

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Figure 2: The measured (red solid) and simulated (blue dot) XRR data of HiPIMS and dcMS deposited Ni films un...

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Figure 3: GiXRD pattern of the nickel film deposited by dcMS, conventional position, at 0.6 Pa, and 150 W pow...

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Figure 4: Cross-sectional SEM image of nickel films that were deposited by (a) HiPIMS, and (b) dcMS at 70° su...

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Figure 5: MOKE loops of nickel films that were deposited by (a–e) HiPIMS and (f–j) dcMS, at various tilt angl...

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Figure 6: The H_c and H_k (for samples with uniaxial anisotropy) of our nickel films measured using MOKE with t...

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Published 20 Sep 2019

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